Thin Film Design & Applications  
  
 
 
 
 

 

Materials Page 
Terminology
References 3 & 4

HfO2 (Hafnia)

l (nm) n k
250 2.30  
300 2.10  
400 2.05  
500 2.00  
600 1.98  
700 1.98  
800 1.98  
900 1.97  
1000 1.97  
1500 1.95  
2000 1.94  
8000 1.88  
9000 1.88 0.03
10000 1.88 0.07
11000 1.88 0.12
12000 1.88 0.22

Bulk Properties

Melting Point:  2812 ºC
Density: 9.7 gm/cc

 

Film Properties

Evap. Temp.: 2500 ºC
Film Growth:  crystalline with low packing density
Film Hardness:  Hard

Common uses:   Overcoat for IR mirrors.  Coating wires for emitters.   Used in UV laser antireflection coatings and high reflectors.  High damage threshold at 0.35mm (especially if deposited from metal form.)

Comments:  Very hard, adherent film.

 

 
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